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Highly efficient elimination performance of graphene/supramolecular porphyrin-based photocatalysis-self-Fenton system towards sulfonamide antibiotics, resistant bacteria and resistance genes

Xi Yu; Zhouping Wang; Yang Lou; Jiawei Zhang; Chengsi Pan; Yongfa Zhu; Jing Xu
Chemical Engineering Journal · Vol. 484 · pp. 149552 · 2024
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Bibliographic Information

JournalChemical Engineering Journal
PublisherElsevier
Publication Date2024-03-01
Publication Year2024
Volume484
Pages149552
Document TypeJournal Article
eISSN1385-8947
DOI10.1016/j.cej.2024.149552
SubjectEnvironmental Science

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NARA Access Coverage1997-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/13858947
Publisher PageOpen Publisher Page
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