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Electronic metal–support interaction–driven photocatalytic chemical mechanical polishing of silicon carbide wafers using Ag-modified CeO2 slurry

Lihong Zhang; Yuhang Qi; Jinghui Lai; Xilian Hu; Bibo Yu; Ziyang Li; Shengli Wang; Chong Luo
Chemical Engineering Journal · Vol. 526 · pp. 171426 · 2025
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Bibliographic Information

JournalChemical Engineering Journal
PublisherElsevier
Publication Date2025-12-01
Publication Year2025
Volume526
Pages171426
Document TypeJournal Article
eISSN1385-8947
DOI10.1016/j.cej.2025.171426
SubjectEnvironmental Science

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NARA Access Coverage1997-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/13858947
Publisher PageOpen Publisher Page
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