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Thiourea-based networks with nanocarbon fillers for antistatic, self-healing, and plasma-resistant elastomers

Tse-Yu Lo; Shu-Fan Li; Chia-Wei Chang; Huan-Wei Lin; Heng-Hsuan Su; Kuan-Hung Liu; Po-Chia Huang; Jiun-Tai Chen
Chemical Engineering Journal · Vol. 534 · pp. 174970 · 2026
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Bibliographic Information

JournalChemical Engineering Journal
PublisherElsevier
Publication Date2026-04-01
Publication Year2026
Volume534
Pages174970
Document TypeJournal Article
eISSN1385-8947
DOI10.1016/j.cej.2026.174970
SubjectEnvironmental Science

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NARA Access Coverage1997-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/13858947
Publisher PageOpen Publisher Page
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