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Reaction engineering of radical-molecular fluorine species in pulsed NF3 plasma for SiGe selective removal

Woo Chang Park; Hong Seong Gil; Dae Whan Kim; Doo San Kim; Yun Jong Jang; Ji Yeon Lee; Kyoung Chan Kim; Su Jeong Yang; Eun Seok Yoon; Jaejun Kim; Jaejik Baek; Kuntack Lee; Geun Young Yeom
Chemical Engineering Journal · Vol. 537 · pp. 176124 · 2026
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Bibliographic Information

JournalChemical Engineering Journal
PublisherElsevier
Publication Date2026-06-01
Publication Year2026
Volume537
Pages176124
Document TypeJournal Article
eISSN1385-8947
DOI10.1016/j.cej.2026.176124
SubjectEnvironmental Science

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NARA Access Coverage1997-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/13858947
Publisher PageOpen Publisher Page
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