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Topographically selective atomic layer deposition of HfO2 thin films in high-aspect-ratio structures by vapor-dosed surface protector

Jiwoo Oh; Chang Mo Yoon; Dong-Hyun Im; Yongju Kwon; Jeongbin Lee; Woohyuk Kim; Daeyeong Kim; Yongjoo Park; Woo-Hee Kim
Chemical Engineering Journal · Vol. 544 · pp. 178997 · 2026
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Abstract

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Bibliographic Information

JournalChemical Engineering Journal
PublisherElsevier
Publication Date2026-09-01
Publication Year2026
Volume544
Pages178997
Document TypeJournal Article
eISSN1385-8947
DOI10.1016/j.cej.2026.178997
SubjectEnvironmental Science

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NARA Access Coverage1997-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/13858947
Publisher PageOpen Publisher Page
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