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Tin-coordinated hybrid photoresists for dose-efficient EUV lithography

Seunghyun Lee; Seokhyeon Baek; Hong-Joon Lee; Jeongjae Park; Kyuha Park; Jaeil Park; Jin Goo Yoon; Jun-Gyu Choi; Sungjun Park; Junghoon Lee
Chemical Engineering Journal · Vol. 547 · pp. 179809 · 2026
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Bibliographic Information

JournalChemical Engineering Journal
PublisherElsevier
Publication Date2026-11-01
Publication Year2026
Volume547
Pages179809
Document TypeJournal Article
eISSN1385-8947
DOI10.1016/j.cej.2026.179809
SubjectEnvironmental Science

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NARA Access Coverage1997-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/13858947
Publisher PageOpen Publisher Page
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