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Ammonia oxidation by in-situ chloride electrolysis in etching wastewater of semiconductor manufacturing using RuSnOx/Ti electrode: Effect of plating mode and metal ratio

Seto Sugianto Prabowo Rahardjo; Yu-Jen Shih; Chen-Shiuan Fan
Journal of Hazardous Materials · Vol. 469 · pp. 134042 · 2024
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Bibliographic Information

JournalJournal of Hazardous Materials
PublisherElsevier
Publication Date2024-05-01
Publication Year2024
Volume469
Pages134042
Document TypeJournal Article
eISSN0304-3894
DOI10.1016/j.jhazmat.2024.134042
SubjectEnvironmental Science

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NARA Access Coverage1975-01-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/03043894
Publisher PageOpen Publisher Page
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