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Enhanced removal of refractory organic pollutants in wafer surface treatment wastewater by combining Fenton oxidation and O3/H2O2/FeOOH: Removal efficiency, intermediate composition, and toxicity prediction

Feng Liu; Huanhuan Zhang; Nian Liu; Junxia Wang; Maolin Chen; Feiyue Qian
Journal of Water Process Engineering · Vol. 64 · pp. 105572 · 2024
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Bibliographic Information

JournalJournal of Water Process Engineering
PublisherElsevier
Publication Date2024-07-01
Publication Year2024
Volume64
Pages105572
Document TypeJournal Article
eISSN2214-7144
DOI10.1016/j.jwpe.2024.105572
SubjectEnvironmental Science

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NARA Access Coverage2014-04-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/22147144
Publisher PageOpen Publisher Page
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