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Advanced nitrogen removal from semiconductor wastewater under fluoride stress via continuous plug-flow anaerobic/oxic/anoxic process: Performance, microbial evolution and mechanisms

Shuo Chen; Wenyi Dong; Fupeng Wang; Huaguang Liu; Zilong Hou; Yanchen Li; Pingyan Zhou; Ruzhen Huang; Hongjie Wang
Journal of Water Process Engineering · Vol. 77 · pp. 108315 · 2025
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Bibliographic Information

JournalJournal of Water Process Engineering
PublisherElsevier
Publication Date2025-09-01
Publication Year2025
Volume77
Pages108315
Document TypeJournal Article
eISSN2214-7144
DOI10.1016/j.jwpe.2025.108315
SubjectEnvironmental Science

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NARA Access Coverage2014-04-01~Current
Journal Homepagehttps://www.sciencedirect.com/science/journal/22147144
Publisher PageOpen Publisher Page
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